| Specification |
Type: Metal Target;
Shape: Round or Customized;
Chemical Composition: Ruthenium;
Application: Semiconductor Coating;
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Type: Molybdenum Rhenium Tungstencomposite;
Shape: Round;
Apply in: Medical Device Industry and Industrial Detecors;
Making Method: Forging;
Style: Standard;
Orignal Materials: Molybdenum,Rhenium,Tungsten;
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Shape: Rectangle, Round, Rotary, Pellets, Ingots, etc;
Delivery Time: 15-18days;
Keywords: Aluminum Magnesium Sputtering Target;
Size: 1''-8'', as Your Request;
Purity: 99.99%;
Main Application: CVD Materials, Aerospave;
Chemical Composition: Al+Mg;
MOQ: 1PC;
Product Name: Xk-Aluminum Magnesium Sputtering Target;
Technology: Melting;
Package: Vacuum Package;
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Type: Alloy Titanium;
Shape: Circular, Rectangular;
Usage: Thin Film Coating;
Size: Accept Custom;
Color: Metal Color;
Purity: High Purity;
Grade: Industrial Grade;
Main Market: Globle;
Chemical Composition: Tial;
Name: Tial70at% Sputtering Target;
Product Name: Titanium Aluminum Sputtering Target;
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Type: Ceramic Target;
Shape: Circular, Rectangular;
Usage: PVD Coating;
Size: Customized Size;
Purity: 3n;
Chemical Composition: Pbtio3;
MOQ: 1PCS;
Surface: Grinding or Polished;
Advantage: High Density;
Product Name: PVD Target Pbtio3 Lead Titanate Sputtering Target;
Production Method: Hip;
Related Products: ZnO, TiO2, ITO, Al2O3, Ta2o5, Nb2o5, etc;
Package: Vacuum Package;
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